99.99% Pure Tungsten Metal Material 4n Tungsten W Sputtering Target

Type:	Metal Target
Shape:	Round
Certification:	ISO
Purity:	99.999% Min
Chemical Composition:	W
Transport Package:	Vacuum Packed or Per Customer′s Request.

Customization:	Available \| Customized Request

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Rheniumet Ltd.

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Rheniumet

Origin

Hunan, China

Production Capacity

10000000 Kilogram/Kilograms Per Month

Product Description

Application:

High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal.

Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers,diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors.
Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells.

Name	Molecular formula	Specification	Size		Relative density	Grain size	Defect rate
Tungsten target	W	4N(99.99%)	Inch	mm	≥99%	≯50µm	0
		5N(99.999%)	D(6,8,10,12) H(0.25,0.5,0.75)	Diameter 150~350 Thickness 6~25
Tungsten Titanium Target	WTi10 WTi20	4N(99.99%)			≥99%	≯50µm	0
		4N5(99.995%)

Chemical component

Specification grade Chemical index			W/(W+Ti)≥99.99%			W/(W+Ti)≥99.995%				W≥99.999%
Total trace impurities			≯100 ppm			≯50 ppm				≯10 ppm
Impurity index(ppm)			Max		Typical value	Max		Typical value		Max		Typical value
Radioactive elements	U		-		0.2	0.1		0.05		0.0008		0.0005
	Th		-		0.2	0.1		0.05		0.0008		0.0005
Alkali metal elements	Li		1		0.05	0.02		0.01		0.01		0.003
	Na		5		1	0.5		0.2		0.1		0.05
	K		5		1	0.1		0.05		0.05		0.03
Mo,Re			10		5	10		5		1		0.5
Fe,Cr			10		5	5		3		0.5		0.3
Ca,Si,Cu,Ni,Al,Zn,Sn,Mn,Co,Hg,V			2		1	0.5		0.3		0.2		0.2
P,As,Se			2		1	0.5		0.2		0.2		0.2
B,Pb,Sb,Be,Ba,Bi,Cd,Ge,Nb,Pt,Mg,Zr,Au,In,Ga,Ag			1		0.5	0.5		0.1		0.1		0.1
All other individual elements			1		0.5	0.5		0.1		0.1		0.1
Gas analysis (≯,ppm)		O		C			N		H		S
		30		20			20		20		10

Depending on the purpose of use, there are different requirements for the impurity content of high-purity tungsten targets and tungsten-titanium targets. Generally, the chemical purity is required to be between 99.99% and 99.999%. We can also customize other specifications suitable for the application according to user requirements.