• 99.95% High Purity Rh Rhodium Sputtering Target Plate / Rh Rhodium Metal Target
  • 99.95% High Purity Rh Rhodium Sputtering Target Plate / Rh Rhodium Metal Target

99.95% High Purity Rh Rhodium Sputtering Target Plate / Rh Rhodium Metal Target

Application: Industrial
Formula: Rhodium
Classification: Metal Traget
Grade Standard: Industrial Grade
Certification: ISO
Shape: Rotary,Flat,Round
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Guangdong, China
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Basic Info.

Model NO.
CYT-Rh
Transport Package
Wooden Box
Specification
Customized Size
Trademark
CANYUAN
Origin
China
Production Capacity
1000PCS

Product Description

99.95% High Purity Rh Rhodium Sputtering Target Plate / Rh Rhodium Metal TargetRhodium is a silver-white and hard metal. Rhodium is a platinum group element with high reflectivity. Rhodium metal usually does not get oxidation. Melting rhodium will absorb oxygen, but release it during solidification. The melting point of rhodium is higher than that of platinum, and its density is lower than that of platinum. Rhodium does not dissolve in most acids. Rhodium is mainly used as rhodium catalysts, rhodium alloys, rhodium coatings, rhodium compounds in the fields of chemistry, petroleum, glass, electronics, dentistry, jewelry, automobiles and so on.

Rhodium sputtering materials can be used for thin film coating, CD-ROM, decoration, flat panel displays, functional coatings, as well as other optical information storage industries, glass coating industries such as automotive glass and architectural glass, optical communication and so on. The main application of rhodium metal in the automotive industry is being use  as a catalytic converter to convert harmful unburned hydrocarbon and nitrogen oxide emissions into harmless gases. It is also used in the glass industry to produce flat glass and glass fibers.


We can make rhodium into rhodium wire, rhodium particles, rhodium sputtering targets, etc.;  
The purity and specifications can be customized.
Also rhodium target materials also include platinum-rhodium alloys.
The description composition analysis table of 4N high-purity Rhodium target as below:
 Targets Specification
Application PVD sputtering materials
Material Rhodium
Purity 3N5
Size customized
Thickness customized
Shape Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density 7.28g/cm3
Melting Point 22600ºC
Produce method casting

99.95% High Purity Rh Rhodium Sputtering Target Plate / Rh Rhodium Metal Target

Our Advantage
99.95% High Purity Rh Rhodium Sputtering Target Plate / Rh Rhodium Metal Target
99.95% High Purity Rh Rhodium Sputtering Target Plate / Rh Rhodium Metal Target


Operation Process
99.95% High Purity Rh Rhodium Sputtering Target Plate / Rh Rhodium Metal Target
99.95% High Purity Rh Rhodium Sputtering Target Plate / Rh Rhodium Metal Target

Packing Picture
99.95% High Purity Rh Rhodium Sputtering Target Plate / Rh Rhodium Metal Target
99.95% High Purity Rh Rhodium Sputtering Target Plate / Rh Rhodium Metal Target
99.95% High Purity Rh Rhodium Sputtering Target Plate / Rh Rhodium Metal Target


Application:
99.95% High Purity Rh Rhodium Sputtering Target Plate / Rh Rhodium Metal Target
99.95% High Purity Rh Rhodium Sputtering Target Plate / Rh Rhodium Metal Target
99.95% High Purity Rh Rhodium Sputtering Target Plate / Rh Rhodium Metal Target

Relating Product
Material Purity
(N)
Components
(wt%)
Density Melting
 Point
Thermal
Conductivity
(Wm-1K-1)
Coefficient of
 expansion
(10-6k-1)
Production
 Process
Al-Alloy 5N - 2.7 660 235 23.1 Smelting
Cr 3N5 - 7.22 1907 94 4.9 HIP
Cu 4N - 8.9 1084 400 16.5 Smelting
Mo-alloy 3N5 - 10.28 2623 139 4.8 HIP
Nb 4N - 8.6 2477 54 7.3 Smelting
Ta 4N - 16.7 3017 57 6.3 Smelting
Si 4N - 2.33 1414 150 2.6 Sintering&Spray
TI 5N - 4.5 1670 22 8.6 Smelting
W 4N - 19.25 3422 174 4.5 HIP
AZO 3N5 98:2 5.6 1975 22 1.5 Sintering
ITO 4N 90:10 7.15 2000 15 2.0 Sintering
GZO 3N5 AS REQUESTED 7.15 - - - Sintering
IGZO 4N AS REQUESTED - - - - Sintering
NbOx 4N - 4.6 1460 5 1.5 Sintering&Spray
TIOx 4N - 4.23 1800 4 7.14 Sintering&Spray
 

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Gold Member Since 2023

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Manufacturer/Factory
Main Products
Sputtering Target
Number of Employees
6