Suppliers with verified business licenses
Audited Supplier
The chromium-tungsten alloy target is made from high-purity chromium and tungsten raw materials through fine grinding, powder mixing, and high-temperature pressing. The target has high density, uniform composition, and fine grain size. Due to the use of thermal isostatic pressing,
The compression process allows the manufacture of larger-sized targets, enabling the scaling up of target size. The size and proportion can be customized according to customer requirements.
| Targets Specification | |
| Application | PVD sputtering materials |
| Material | chromium-tungsten |
| Purity | 3N |
| Size | customized |
| Thickness | customized |
| Shape | Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type |
| Density | -g/cm3 |
| Melting Point | -ºC |
| Produce method | HIP |
| Material | Purity (N) |
Components (wt%) |
Density | Melting Point |
Thermal Conductivity (Wm-1K-1) |
Coefficient of expansion (10-6k-1) |
Production Process |
| Al-Alloy | 5N | - | 2.7 | 660 | 235 | 23.1 | Smelting |
| Cr | 3N5 | - | 7.22 | 1907 | 94 | 4.9 | HIP |
| Cu | 4N | - | 8.9 | 1084 | 400 | 16.5 | Smelting |
| Mo-alloy | 3N5 | - | 10.28 | 2623 | 139 | 4.8 | HIP |
| Nb | 4N | - | 8.6 | 2477 | 54 | 7.3 | Smelting |
| Ta | 4N | - | 16.7 | 3017 | 57 | 6.3 | Smelting |
| Si | 4N | - | 2.33 | 1414 | 150 | 2.6 | Sintering&Spray |
| TI | 5N | - | 4.5 | 1670 | 22 | 8.6 | Smelting |
| W | 4N | - | 19.25 | 3422 | 174 | 4.5 | HIP |
| AZO | 3N5 | 98:2 | 5.6 | 1975 | 22 | 1.5 | Sintering |
| ITO | 4N | 90:10 | 7.15 | 2000 | 15 | 2.0 | Sintering |
| GZO | 3N5 | AS REQUESTED | 7.15 | - | - | - | Sintering |
| IGZO | 4N | AS REQUESTED | - | - | - | - | Sintering |
| NbOx | 4N | - | 4.6 | 1460 | 5 | 1.5 | Sintering&Spray |
| TIOx | 4N | - | 4.23 | 1800 | 4 | 7.14 | Sintering&Spray |
Suppliers with verified business licenses
Audited Supplier 
){kind=link}
){kind=link}