Product Description
CISRI offers various of sputtering targets for FPD applications such as TN, STN, TFT-LCD, FED, PDP, OLED and CF(Color Filter).
These targets include: Cr, Mo, AZO, Al, AG, Ta, W, etc.
The largest HIP equipment in China is located in CISRI, which can be used to produce the high purity Cr target with length over 1800mm. Furthermore, CISRI owns the largest vacuum sintering furnace with high temperature, which can be used to produce the high purity Cr target with large dimension.
Properies of Cr Target |
Purity |
99.95% ~ 99.98% (3N5 ~ 3N8) |
Relative Density |
>99.6% |
Grain Size |
<150µm |
Dimension |
Max Length: 1800mm; Max Width: 350mm; Max Dia: 500mm;Max Length for tube: 4000mm |
Other special specifications are available on customers' request. |
Properies of Cr Rotary Target |
Purity |
>99.5% (2N5 ) |
Relative Density |
>90% |
Production Process |
Plasma Spray Process or HIP |
Dimension |
Max Length: 4000mm |
Other special specifications are available on customers' request. |
FAQ
Q1: Are you a manufacturer? |
A1: Yes, we have large-scale, modern factory located in Kunshan City, Jiangsu Province, China. We can provide OEM/OOM services for customers around the world. |
Q2: What about the quality of your products? |
A2: Our production process is in conformity with ISO 9001. All products we supplied are strictly tested before shipment. |
O3: Can you offer samples to test before the formal order? |
A3: Yes, we can provide the existing item's sample. If there is any special feature requirement, please contact us for more details. |
O4: How long is usually your delivery time? |
A4: Our delivery time is usually within 14 days after we receive your order. |
O5: What is your Shipping Methods? |
A5: By Sea; By air; or by UPS/DHL/FedEx/TNT etc. |
Company Profile
More details please contact us.